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Quantitative SNMS Depth Profiling of a MoS/Ti Multilayer

Acknowledgement: Sample courtesy of Dr M Simmonds, Paul Scherrer Institute, CH-5232 Villigen PSI, Switzerland.

20 nm MoS/Ti multilayer structure analysed by SNMS depth profiling at normal incidence using 5 KeV Ar primary beam. The data show excellent depth resolution and measurement of other impurities in the film (for example O and C) are also possible.