CSMA Increases Analytical Capability

Several analytical techniques are now available, including:

• SNMS (Sputtered Neutral Mass Spectrometry)
• ULE-SIMS (Ultra Low-Energy Secondary Ion Mass Spectrometry)
• RBS (Rutherford Backscattering Spectroscopy)
• SAM (Scanning Acoustic Microscopy)
• TEM (Transmission Electron Microscopy)

This enhanced capability offers analytical benefits in several application areas including:

• Ultra Shallow Junctions
• Silicon Germanium and related Materials
• Characterisation of Functional Coatings on Glass and Polymers
• Precision optics
• High K and Low K materials
• Nanomaterials

Examples of Work:

Measurement of B and P levels in BPSG layers.
Determination of stiochoimetry of a variety of nitrides and oxides on silicon.
Non-destructive investigation of delamination of device components on ICs.
Propriety multi technique approach to measure the thickness of oxide on metal powders and fibres.